Computational analysis and chemical mechanical polishing for manufacturing of optical components

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Computational analysis and chemical mechanical polishing for manufacturing of optical components

NANYANGTECHNOLOGICALUNIVERSITYCOMPUTATIONAL ANALYSIS ANDCHEMICAL MECHANICAL POLISHING FORMANUFACTURING OF OPTICAL COMPONENTSNGUYEN NHU YSCHOOL OF MECH

Computational analysis and chemical mechanical polishing for manufacturing of optical components HANICAL & AEROSPACEENGINEERING2016COMPUTATIONAL ANALYSIS ANDCHEMICAL MECHANICAL POLISHING FORMANT IALTERING OF OPTICAL COMPONENTSNGUYEN NHU VSCHOOL OF

MECHANICAL & AEROSPACE ENGINEERINGA thesis submitted to the Nanyang Technological I Diversity in partial fulfilment of the requirement for the degree Computational analysis and chemical mechanical polishing for manufacturing of optical components

of Doctor of Philosophy2016ABSTRACTHigh precision optical components arc required lor modem life and future. Io achieve component s surfaces with hig

Computational analysis and chemical mechanical polishing for manufacturing of optical components

h quality, chemical mechanical polishing (CMP) is required. Tr is a unique method to obtain rhe global uniformity planarization across the surface wit

NANYANGTECHNOLOGICALUNIVERSITYCOMPUTATIONAL ANALYSIS ANDCHEMICAL MECHANICAL POLISHING FORMANUFACTURING OF OPTICAL COMPONENTSNGUYEN NHU YSCHOOL OF MECH

Computational analysis and chemical mechanical polishing for manufacturing of optical components pad with abrasive-free slurry and phase two is using rhe soft pad (rhe fabric cloth pad) with colloidal silica shiny. This process has created a bette

r uniformity surface with lower surface roughness.The non-unifor mity of substrates after polishing is one of the most interesting things in cunent tr Computational analysis and chemical mechanical polishing for manufacturing of optical components

ends in research. One of the reasons for the non-iunfonnity IS a pad wear profile. Researching on the pad weal profile by improving the pad conditioni

Computational analysis and chemical mechanical polishing for manufacturing of optical components

ng process creates a better pad surface, and through that the substrates is polished with better uniformity. Another reason for the lion-uniformity is

NANYANGTECHNOLOGICALUNIVERSITYCOMPUTATIONAL ANALYSIS ANDCHEMICAL MECHANICAL POLISHING FORMANUFACTURING OF OPTICAL COMPONENTSNGUYEN NHU YSCHOOL OF MECH

Computational analysis and chemical mechanical polishing for manufacturing of optical components rch, an analytical model was established by combining of the kinematic motions and the contact lime to investigate the pad wear lion-uniformity. The r

esults have indicated that rhe cutting path density and the contact time at positions near the pad center arc more than that near the pad edge. It is Computational analysis and chemical mechanical polishing for manufacturing of optical components

a good agreement with experiments. New shapes of the pad and the conditioner have been developed to create a better pad wear profile. The pad after co

Computational analysis and chemical mechanical polishing for manufacturing of optical components

nditioning is convex and more uniform.Page 1In addition, a new computational fluid dynamic model was built. It was a combination of multiphase and dis

NANYANGTECHNOLOGICALUNIVERSITYCOMPUTATIONAL ANALYSIS ANDCHEMICAL MECHANICAL POLISHING FORMANUFACTURING OF OPTICAL COMPONENTSNGUYEN NHU YSCHOOL OF MECH

Computational analysis and chemical mechanical polishing for manufacturing of optical components he gap were quantified to characterize their mechanical effects under different operating parameters. The simulation results have show'll that the pan

icles are non-unitormly distributed below rhe wafer and provided a deeper insight understanding of the material removal of the CMP mechanism. From the Computational analysis and chemical mechanical polishing for manufacturing of optical components

understanding above, a new idea has been developed to explain the mechanism of the CMP processes.Page 11ACKNOWLEDGEMENTI n st of all. 1 would like to

Computational analysis and chemical mechanical polishing for manufacturing of optical components

express my gratitude to my supervisor. Associate Professor Zhong Zhaowei, for his supports, encouragements and insightful advice throughout my candid

NANYANGTECHNOLOGICALUNIVERSITYCOMPUTATIONAL ANALYSIS ANDCHEMICAL MECHANICAL POLISHING FORMANUFACTURING OF OPTICAL COMPONENTSNGUYEN NHU YSCHOOL OF MECH

Computational analysis and chemical mechanical polishing for manufacturing of optical components rt, training and discussion in rhe research, also for supplements for experiments.I would also like to thank Nanyang Technological University and SIMT

ech for providing an excellent environment for my Ph -D studies.I wish to thank my husband and my daughter for their strong supports, encouragements. Computational analysis and chemical mechanical polishing for manufacturing of optical components

1 also thank my deal’ parents, my sister, and my brother for encouraging in all my endeavours.Special thanks to iny dear friends who has discussed and

Computational analysis and chemical mechanical polishing for manufacturing of optical components

helped me in my work andmy life.Page I 111LIST OF PUBLICATIONS

NANYANGTECHNOLOGICALUNIVERSITYCOMPUTATIONAL ANALYSIS ANDCHEMICAL MECHANICAL POLISHING FORMANUFACTURING OF OPTICAL COMPONENTSNGUYEN NHU YSCHOOL OF MECH